Interplay between plasma modification of surfaces & atomic layer deposition for semiconductor applications

Swerts, JohanJohanSwertsAdelmann, ChristophChristophAdelmannArmini, SilviaSilviaArminiDelabie, AnneliesAnneliesDelabieNyns, LauraLauraNynsPopovici, Mihaela IoanaMihaela IoanaPopoviciSchaekers, MarcMarcSchaekersVerdonck, PatrickPatrickVerdonckVan Elshocht, SvenSvenVan Elshocht2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21573Interplay between plasma modification of surfaces & atomic layer deposition for semiconductor applicationsMeeting abstract