The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition

De Schepper, PeterPeterDe SchepperEl Otell, ZiadZiadEl OtellVaglio Pret, AlessandroAlessandroVaglio PretAltamirano Sanchez, EfrainEfrainAltamirano SanchezDe Gendt, StefanStefanDe Gendt2021-10-222021-10-2220151612-8850https://imec-publications.be/handle/20.500.12860/25150The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist compositionJournal articlehttp://onlinelibrary.wiley.com/doi/10.1002/ppap.201400157/abstract