Loo, RogerRogerLooVerheyen, PeterPeterVerheyenEneman, GeertGeertEnemanRooyackers, RitaRitaRooyackersLeys, FrederikFrederikLeysShamiryan, DenisDenisShamiryanDe Meyer, KristinKristinDe MeyerAbsil, PhilippePhilippeAbsilCaymax, MattyMattyCaymax2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10803Characteristics of Selective Epitaxial SiGe and Si Deposition processes for recessed source/drain applicationsProceedings paper