Saidov, KhakimjonKhakimjonSaidovErofeev, IvanIvanErofeevAabdin, ZainulZainulAabdinPacco, AntoineAntoinePaccoPhilipsen, HaroldHaroldPhilipsenHartanto, Antony WinataAntony WinataHartantoChen, YifanYifanChenYan, HongweiHongweiYanTjiu, Weng WeeiWeng WeeiTjiuHolsteyns, FrankFrankHolsteynsMirsaidov, UtkurUtkurMirsaidov2024-09-242023-12-232024-09-2420241616-301XWOS:001121643300001https://imec-publications.be/handle/20.500.12860/43290Controlled Stepwise Wet Etching of Polycrystalline Mo NanowiresJournal article10.1002/adfm.202310838WOS:001121643300001LINE-EDGE ROUGHNESSRESISTIVITYTECHNOLOGYFUTURE