Plasma charging damage issues in copper single and dual damascene, oxide and low-k dielectric interconnects

Van den bosch, G.G.Van den boschDe Jaeger, BriceBriceDe JaegerTokei, ZsoltZsoltTokeiGroeseneken, GuidoGuidoGroeseneken2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5728Plasma charging damage issues in copper single and dual damascene, oxide and low-k dielectric interconnectsProceedings paper