Verdonck, PatrickPatrickVerdonckSwart, J.J.SwartBrasseur, GuyGuyBrasseurDe Geyter, PascalPascalDe Geyter2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/434Analysis of the etch rate limiting steps in dry etching of tungsten in fluorine containing plasmasProceedings paper