Kubicek, StefanStefanKubicekChen, JerryJerryChenRagnarsson, Lars-AkeLars-AkeRagnarssonCarter, RichardRichardCarterKaushik, VidyaVidyaKaushikLujan, GuilhermeGuilhermeLujanCartier, EduardEduardCartierHenson, KirklenKirklenHensonPantisano, LuigiLuigiPantisanoBeckx, StephanStephanBeckxJaenen, PatrickPatrickJaenenBoullart, WernerWernerBoullartCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsDe Meyer, KristinKristinDe Meyer2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7759Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flowProceedings paper