EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

Nagahara, S.S.NagaharaDinh, C.Q.C.Q.DinhYoshida, KeisukeKeisukeYoshidaShiraishi, G.G.ShiraishiKondo, Y.Y.KondoYoshihara, K.K.YoshiharaNafus, KathleenKathleenNafusPetersen, JohnJohnPetersenDe Simone, DaniloDaniloDe SimoneFoubert, PhilippePhilippeFoubertVandenberghe, GeertGeertVandenbergheStock, H.H.StockMeliorisz, B.B.Meliorisz2021-10-292021-10-292020https://imec-publications.be/handle/20.500.12860/35635EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivityProceedings paper10.1117/12.2552166