Atomic layer etching of amorphous silicon with selectivity towards MoS2

Heyne, MarkusMarkusHeyneGoodyear, AndyAndyGoodyearde Marneffe, Jean-FrancoisJean-Francoisde MarneffeCooke, MikeMikeCookeRadu, IulianaIulianaRaduNeyts, Erik C.Erik C.NeytsDe Gendt, StefanStefanDe Gendt2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28508Atomic layer etching of amorphous silicon with selectivity towards MoS2Meeting abstracthttps://aldconference.avs.org/wp-content/uploads/2017/05/ALD-Tech-Program-4.7-1.pdf