Ercken, MoniqueMoniqueErckenMoelants, MyriamMyriamMoelantsPollers, IngridIngridPollersVan Puyenbroeck, IlseIlseVan PuyenbroeckGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonsePawlowski, G.G.PawlowskiSpiess, WalterWalterSpiess2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3449Optimization of an advanced positive DUV resist for 248 nm L/S pattern printingJournal article