Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma: Modeling and experimental investigation

Samara, VladimirVladimirSamaraVan Laer, KoenKoenVan LaerTinck, StefanStefanTinckde Marneffe, Jean-FrancoisJean-Francoisde MarneffeBogaerts, AnnemieAnnemieBogaerts2021-10-212021-10-2120130963-0252https://imec-publications.be/handle/20.500.12860/23034Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma: Modeling and experimental investigationJournal articlehttp://iopscience.iop.org/0963-0252/22/2/025011/