Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation

Lee, InhwanInhwanLeeFranke, Joern-HolgerJoern-HolgerFrankePhilipsen, VickyVickyPhilipsenRonse, KurtKurtRonseDe Gendt, StefanStefanDe GendtHendrickx, EricEricHendrickx2025-08-282025-08-282025-AUG 11944-8244WOS:001553815300001https://imec-publications.be/handle/20.500.12860/46124Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical ImplementationJournal article10.1021/acsami.5c11891WOS:001553815300001MULTILAYER MIRRORSLA/BMEDLINE:40785079