Vaglio Pret, AlessandroAlessandroVaglio PretPoliakov, PavelPavelPoliakovGronheid, RoelRoelGronheidBlomme, PieterPieterBlommeMiranda Corbalan, MiguelMiguelMiranda CorbalanDehaene, WimWimDehaeneVerkest, DiederikDiederikVerkestVan Houdt, JanJanVan HoudtBianchi, DavideDavideBianchi2021-10-202021-10-2020120167-9317https://imec-publications.be/handle/20.500.12860/21664Linking EUV lithography line edge roughness and 16 nm NAND memory performanceJournal articlehttp://www.sciencedirect.com/science/article/pii/S0167931712001700