Impact of mask corner rounding on pitch 40 nm contact hole variability

van Look, LieveLievevan LookGillijns, WernerWernerGillijnsGallagher, EmilyEmilyGallagher2023-01-192022-05-222023-01-192021978-1-5106-4552-30277-786XWOS:000792657300002https://imec-publications.be/handle/20.500.12860/39866Impact of mask corner rounding on pitch 40 nm contact hole variabilityProceedings paper10.1117/12.2601850978-1-5106-4553-0WOS:000792657300002