High performance high-k/metal gate Ge pMOSFETs with gate lengths down to 125 nm and halo implant

De Jaeger, BriceBriceDe JaegerNicholas, GarethGarethNicholasBrunco, DavidDavidBruncoEneman, GeertGeertEnemanMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-10-162021-10-162007-09https://imec-publications.be/handle/20.500.12860/11954High performance high-k/metal gate Ge pMOSFETs with gate lengths down to 125 nm and halo implantProceedings paper