Shamiryan, DenisDenisShamiryanParaschiv, VasileVasileParaschivBeckx, StephanStephanBeckxBoullart, WernerWernerBoullart2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11192TaN metal gate etch with BCl3/O2 plamsa: gate profile and impact on high-k removal processOral presentation