Pinho, NelsonNelsonPinhoChery, EmmanuelEmmanuelCheryBhatia, RitwikRitwikBhatiaSundaram, GaneshGaneshSundaramSlabbekoorn, JohnJohnSlabbekoornKrishtab, MikhailMikhailKrishtabMiller, AndyAndyMillerBeyne, EricEricBeyne2024-05-272023-10-242024-05-2720230569-5503WOS:001047624100337https://imec-publications.be/handle/20.500.12860/42943Inorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliabilityProceedings paper10.1109/ECTC51909.2023.00350979-8-3503-3498-2WOS:001047624100337