Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations

Constantoudis, VassiliosVassiliosConstantoudisPapvieros, GeorgeGeorgePapvierosGogolides, EvangelosEvangelosGogolidesVaglio Pret, AlessandroAlessandroVaglio PretPathangi Sriraman, HariHariPathangi SriramanGronheid, RoelRoelGronheid2021-10-242021-10-2420171932-5150https://imec-publications.be/handle/20.500.12860/28062Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlationsJournal articlehttps://doi.org/10.1117/1.JMM.16.2.024001