High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography

Hibino, DaisukeDaisukeHibinoShindo, HiroyukiHiroyukiShindoAbe, YuuichiYuuichiAbeHojyo, YutakaYutakaHojyoFenger, GermainGermainFengerDo, ThuyThuyDoKusnadi, IrIrKusnadiSturtevant, John L.John L.SturtevantDe Bisschop, PeterPeterDe BisschopVan de Kerkhove, JeroenJeroenVan de Kerkhove2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17264High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithographyProceedings paper