Barbarin, YohanYohanBarbarinCroes, KristofKristofCroesRoussel, PhilippePhilippeRousselLi, YunlongYunlongLiVerdonck, PatrickPatrickVerdonckBaklanov, MikhaïlMikhaïlBaklanovTokei, ZsoltZsoltTokeiZhao, LarryLarryZhao2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22017Reliability characteristics of thin porous low-k silica-based interconnect dielectricsProceedings paper