Chemical and structural analysis of etching residue layers in semiconductor devices with energy filtering transmission electron microscopy

Hens, S.S.HensVan Landuyt, J.J.Van LanduytBender, HugoHugoBenderBoullart, WernerWernerBoullartVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5340Chemical and structural analysis of etching residue layers in semiconductor devices with energy filtering transmission electron microscopyJournal article