Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applications

Vertommen, JohanJohanVertommenKlippert, W.W.KlippertGoethals, MiekeMiekeGoethalsVan Roey, FriedaFriedaVan Roey2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/3129Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applicationsJournal article