Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasma

Urbanowicz, AdamAdamUrbanowiczCremel, MaximeMaximeCremelVanstreels, KrisKrisVanstreelsShamiryan, DenisDenisShamiryanDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18114Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasmaMeeting abstract