Study of the initial substrate surface and nucleation process of InAs NW epitaxy on Si (111)

Liu, ZiyangZiyangLiuMerckling, ClementClementMercklingRooyackers, RitaRitaRooyackersFranquet, AlexisAlexisFranquetRichard, OlivierOlivierRichardBender, HugoHugoBenderVila Santos, MariaMariaVila SantosRubio-Zuazo, JuanJuanRubio-ZuazoCastro, GermánGermánCastroCollaert, NadineNadineCollaertThean, AaronAaronTheanVandervorst, WilfriedWilfriedVandervorstHeyns, MarcMarcHeyns2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26921Study of the initial substrate surface and nucleation process of InAs NW epitaxy on Si (111)Oral presentation