ALD as an enabler of self-aligned multiple patterning schemes

Van Elshocht, SvenSvenVan ElshochtTao, ZhengZhengTaoEveraert, Jean-LucJean-LucEveraertDemuynck, StevenStevenDemuynckAltamirano Sanchez, EfrainEfrainAltamirano Sanchez2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/29674ALD as an enabler of self-aligned multiple patterning schemesProceedings paper