Altamirano Sanchez, EfrainEfrainAltamirano SanchezVaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheidBoullart, WernerWernerBoullart2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20283Dry etching challenges for patterning smooth lines : LWR reduction of extreme ultra violet photo resistProceedings paper