Improving low-temperature APCVD SiO2 passivation by rapid themal annealing for Si devices

Sivoththaman, SivanarayanamoorthySivanarayanamoorthySivoththamanDe Schepper, PatrickPatrickDe SchepperLaureys, WimWimLaureysNijs, JohanJohanNijsMertens, RobertRobertMertens2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2955Improving low-temperature APCVD SiO2 passivation by rapid themal annealing for Si devicesJournal article