Computer simulations of SiCl4/O2 ICP discharges used for coatings deposition or mask damage recovery

Tinck, StefanStefanTinckBogaerts, AnnemieAnnemieBogaertsBoullart, WernerWernerBoullart2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21610Computer simulations of SiCl4/O2 ICP discharges used for coatings deposition or mask damage recoveryMeeting abstract