Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material

Travaly, YoussefYoussefTravalyKemeling, N.N.KemelingMaenhoudt, MireilleMireilleMaenhoudtPeeters, S.S.PeetersTokei, ZsoltZsoltTokeiAbell, ThomasThomasAbellSchuhmacher, JörgJörgSchuhmacherTurturro, S.S.TurturroVos, IngridIngridVosEugene, LinoLinoEugeneMatsuki, N.N.MatsukiFukazawa, A.A.FukazawaGoundar, K.K.GoundarSatoh, K.K.SatohKato, M.M.KatoKaneko, S.S.KanekoVertommen, JohanJohanVertommenSprey, HesselHesselSpreyVan Hove, MarleenMarleenVan HoveJonas, A.A.JonasMaex, KarenKarenMaex2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9689Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k materialProceedings paper