High throughput grating qualification of directed self-assembly patterns using optical metrology

Van Look, LieveLieveVan LookRincon Delgadillo, PaulinaPaulinaRincon DelgadilloLee, Yu-tsungYu-tsungLeePollentier, IvanIvanPollentierGronheid, RoelRoelGronheidCao, YiYiCaoLin, GuanyangGuanyangLinNealey, Paul F.Paul F.Nealey2021-10-222021-10-2220140167-9317https://imec-publications.be/handle/20.500.12860/24709High throughput grating qualification of directed self-assembly patterns using optical metrologyJournal articlehttp://www.sciencedirect.com/science/article/pii/S0167931714003414