Vantomme, AndreAndreVantommeDegroote, S.S.DegrooteDekoster, J.J.DekosterBender, HugoHugoBenderLangouche, G.G.Langouche2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1618Effects of growth parameters on the epitaxy of CoSi2//Si(100) formed by reactive deposition epitaxyProceedings paper