Op de Beeck, MaaikeMaaikeOp de BeeckVandenberghe, GeertGeertVandenbergheJaenen, PatrickPatrickJaenenFeng, Hong ZhangHong ZhangFengDelvaux, ChristieChristieDelvauxRichardson, PaulPaulRichardsonVan Puyenbroeck, IlseIlseVan PuyenbroeckRonse, KurtKurtRonseLamb, J. E.J. E.Lambvan der Hilst, J. B. C.J. B. C.van der Hilstvan Wingerden, JohannesJohannesvan Wingerden2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2840Bottom-ARC optimization methodology for 0.25μm lithography and beyondProceedings paper