Post-etch cleaning after dry etching the emitter windows to improve the bipolar characteristics in a 0.5 µm BiCMOS technology

Decoutere, StefaanStefaanDecoutereVanhaelemeersch, SergeSergeVanhaelemeerschDeferm, LudoLudoDefermVleugels, FrankFrankVleugelsVancuyck, GeertGeertVancuyck2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/129Post-etch cleaning after dry etching the emitter windows to improve the bipolar characteristics in a 0.5 µm BiCMOS technologyProceedings paper