Vereecke, GuyGuyVereeckeKesters, ElsElsKestersLe, Quoc ToanQuoc ToanLeClaes, MartineMartineClaesLux, MarcelMarcelLuxStruyf, HerbertHerbertStruyfCarleer, RobertRobertCarleerAdriaensens, PeterPeterAdriaensens2021-10-212021-10-2120130167-9317https://imec-publications.be/handle/20.500.12860/23331An environment friendly wet strip process for 193 nm lithography patterning in BEOL applicationsJournal article