Claes, MartineMartineClaesLe, Quoc ToanQuoc ToanLeKeldermans, J.J.KeldermansKesters, ElsElsKestersLux, MarcelMarcelLuxFranquet, AlexisAlexisFranquetVereecke, GuyGuyVereeckeMertens, PaulPaulMertensFrank, Martin M.Martin M.FrankCarleer, R.R.CarleerAdriaensens, P.P.AdriaensensVanderzande, DirkDirkVanderzande2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13530Photoresist characterization and wet strip after low-k dry etchProceedings paper