Van Steenwinckel, DavidDavidVan SteenwinckelGronheid, RoelRoelGronheidLammers, J.H.J.H.Lammers2021-10-172021-10-1720081363-5182https://imec-publications.be/handle/20.500.12860/14680Resolution, line width roughness and sensitivity in advanced photoresistsJournal article