Sub 0.1 mm nMOSFETs fabricated using experimental design techniques to optimise performance and minimise process sensitivity

Kubicek, StefanStefanKubicekBiesemans, SergeSergeBiesemansWang, QingfengQingfengWangMaex, KarenKarenMaexDe Meyer, KristinKristinDe Meyer2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/710Sub 0.1 mm nMOSFETs fabricated using experimental design techniques to optimise performance and minimise process sensitivityProceedings paper