Optimized post-CMP and Pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers

Loo, RogerRogerLooSouriau, LaurentLaurentSouriauOng, PatrickPatrickOngKenis, KarineKarineKenisRip, JensJensRip2021-10-182021-10-182010-09https://imec-publications.be/handle/20.500.12860/17527Optimized post-CMP and Pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffersMeeting abstract