Kottantharayil, AnilAnilKottantharayilVerheyen, PeterPeterVerheyenCollaert, NadineNadineCollaertDixit, AbhisekAbhisekDixitKaczer, BenBenKaczerSnow, JimJimSnowVos, RitaRitaVosLocorotondo, SabrinaSabrinaLocorotondoDegroote, BartBartDegrooteShi, XiaopingXiaopingShiRooyackers, RitaRitaRooyackersMannaert, GeertGeertMannaertBrus, StephanStephanBrusYim, Yong SikYong SikYimLauwers, AnneAnneLauwersGoodwin, MichaelMichaelGoodwinKittl, JorgeJorgeKittlVan Dal, MarkMarkVan DalRichard, OlivierOlivierRichardVeloso, AnabelaAnabelaVelosoKubicek, StefanStefanKubicekBeckx, StephanStephanBeckxBoullart, WernerWernerBoullartDe Meyer, KristinKristinDe MeyerAbsil, PhilippePhilippeAbsilJurczak, GosiaGosiaJurczakBiesemans, SergeSergeBiesemans2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10723CMP-less integration of fully Ni-silicided metal gates in FinFETs by simultaneous silicidation of the source, drain, and the gate using a novel dual hard mask approachProceedings paper