Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography

Osaki, MayukaMayukaOsakiTanaka, MakiMakiTanakaShishido, ChieChieShishidoCheng, ShauneeShauneeChengLaidler, DavidDavidLaidlerErcken, MoniqueMoniqueErckenAltamirano Sanchez, EfrainEfrainAltamirano Sanchez2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/15954Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithographyProceedings paper