Validation of vapor phase decomposition - droplet collection - total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers

Hellin, DavidDavidHellinRip, JensJensRipArnauts, SophiaSophiaArnautsDe Gendt, StefanStefanDe GendtMertens, PaulPaulMertensVinckier, ChrisChrisVinckier2021-10-152021-10-152004-09https://imec-publications.be/handle/20.500.12860/9017Validation of vapor phase decomposition - droplet collection - total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafersJournal article