Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime

Zhang, Yu-RuYu-RuZhangTinck, StefanStefanTinckDe Schepper, PeterPeterDe SchepperWang, You-NianYou-NianWangBogaerts, AnnemieAnnemieBogaerts2021-10-232021-10-2320150734-2101https://imec-publications.be/handle/20.500.12860/26245Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regimeJournal articlehttp://scitation.aip.org/content/avs/journal/jvsta/33/2/10.1116/1.4906819