EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction

Bekaert, JoostJoostBekaertDe Bisschop, PeterPeterDe BisschopBeral, ChristopheChristopheBeralHendrickx, EricEricHendrickxvan de Kerkhof, Mark A..Mark A..van de KerkhofBouten, SanderSanderBoutenKupers, MichielMichielKupersSchiffelers, GuidoGuidoSchiffelersVerduijn, ErikErikVerduijnBrunner, TimothyTimothyBrunner2021-10-252021-10-2520181932-5150https://imec-publications.be/handle/20.500.12860/30226EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reductionJournal articlehttps://doi.org/10.1117/1.JMM.17.4.041013