Optimisation of a pre-metal-dielectric with a contact etch stop layer for 0.18μm and 0.13μm technologies

De Jaeger, BriceBriceDe JaegerVan den bosch, G.G.Van den boschVan Hove, MarleenMarleenVan HoveDebusschere, IngridIngridDebusschereSchaekers, MarcMarcSchaekersBadenes, GonçalGonçalBadenes2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4255Optimisation of a pre-metal-dielectric with a contact etch stop layer for 0.18μm and 0.13μm technologiesProceedings paper