Modeling and experiments of dopant diffusion and defects for laser annealed junctions and advanced USJ

Noda, TajiTajiNodaVandervorst, WilfriedWilfriedVandervorstFelch, S.S.FelchParihar, V.V.PariharVrancken, ChristaChristaVranckenHoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14220Modeling and experiments of dopant diffusion and defects for laser annealed junctions and advanced USJProceedings paper