Lujan, GuilhermeGuilhermeLujanSchram, TomTomSchramPantisano, LuigiLuigiPantisanoHooker, JacobJacobHookerKubicek, StefanStefanKubicekRöhr, ErikaErikaRöhrSchuhmacher, JörgJörgSchuhmacherKilpela, OlliOlliKilpelaSprey, HesselHesselSpreyDe Gendt, StefanStefanDe GendtDe Meyer, KristinKristinDe Meyer2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6559Impact of ALCVD and PVD titanium nitride deposition on metal gate capacitorsProceedings paper