Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties

Popovici, Mihaela IoanaMihaela IoanaPopoviciGroven, BenjaminBenjaminGrovenMarcoen, KristofKristofMarcoenPhung, QuanQuanPhungDutta, ShibeshShibeshDuttaSwerts, JohanJohanSwertsMeersschaut, JohanJohanMeersschautVan den Berg, JaapJaapVan den BergFranquet, AlexisAlexisFranquetMoussa, AlainAlainMoussaVanstreels, KrisKrisVanstreelsLagrain, PieterPieterLagrainBender, HugoHugoBenderJurczak, GosiaGosiaJurczakVan Elshocht, SvenSvenVan ElshochtDelabie, AnneliesAnneliesDelabieAdelmann, ChristophChristophAdelmann2021-10-242021-10-2420170897-4756https://imec-publications.be/handle/20.500.12860/29205Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film propertiesJournal articlehttp://pubs.acs.org/doi/abs/10.1021/acs.chemmater.6b0543710.1021/acs.chemmater.6b05437