Optical emission during the plasma etch for process control of the litho-etch bias

Altamirano Sanchez, EfrainEfrainAltamirano SanchezKunnen, EddyEddyKunnenBoullart, WernerWernerBoullart2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/11639Optical emission during the plasma etch for process control of the litho-etch biasProceedings paper