Recent findings in electrical behavior of CMOS high-K dielectric/metal gate stacks

Ghibaudo, GerardGerardGhibaudoCoignus, JeanJeanCoignusCharbonnier, MatthieuMatthieuCharbonnierMitard, JeromeJeromeMitardLeroux, CharlesCharlesLerouxGarros, XavierXavierGarrosClerc, RaphaelRaphaelClercReimbold, GillesGillesReimbold2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18951Recent findings in electrical behavior of CMOS high-K dielectric/metal gate stacksProceedings paper