Identification of critical parameters for plasma process-induced damage in 130 and 100 nm CMOS technologies

Van den Bosch, GeertGeertVan den BoschDe Jaeger, BriceBriceDe JaegerTokei, ZsoltZsoltTokeiGroeseneken, GuidoGuidoGroeseneken2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6921Identification of critical parameters for plasma process-induced damage in 130 and 100 nm CMOS technologiesProceedings paper